Low-Temperature Naturatron Sputtering System for Deposition of Indium Tin Oxide Film

Author

Thungsuk, Nuttee ; Yuji, Toshifumi ; Kasayapanand, Nat ; Mungkung, Narong ; Nuachauy, Peerapong ; Arunrungrusmi, Somchai ; Nakabayashi, Kenichi ; Okamura, Yasuyuki ; Kinoshita, Hiroyuki ; Kataoka, Haruno ; Suzaki, Yasumasa ; Hirata, Takaomi

Author_Institution

Div. of Energy Technol., King Mongkut´s Univ. of Technol. Thonburi, Bangkok, Thailand

Volume

42

Issue

10

fYear

2014

fDate

Oct. 2014

Firstpage

3391

Lastpage

3396

Abstract

In this paper, we have newly developed a metal thin film-forming sputtering system using the Naturatron Sputtering method that can prevent the plastic film from suffering damage caused by the high-energy particles in plasma and carry out the low-temperature high-density metal deposition with a sputtering chamber and a film deposition chamber separated from each other. This system has made it possible to deposit the indium tin oxide (ITO) thin film on the poly(ethylene naphthalate) film as a substrate. As a result of energy-dispersive X-ray spectroscopy analysis or scanning electron microscope analysis performed for the ITO thin film, it has been proven that the uniform-surface ITO thin film can be deposited on a plastic film.

Keywords

X-ray chemical analysis; indium compounds; scanning electron microscopy; sputter deposition; thin films; tin compounds; ITO; energy-dispersive X-ray spectroscopy; film deposition chamber; high-energy particles; indium tin oxide film; low-temperature high-density metal deposition; low-temperature naturatron sputtering system; metal thin film-forming sputtering system; plastic film; poly(ethylene naphthalate) film; scanning electron microscopy; sputtering chamber; Educational institutions; Indium tin oxide; Photovoltaic cells; Plasmas; Sputtering; Substrates; Surface treatment; Argon + oxygen mixture gas; Argon + oxygen mixture gas; Naturatron Sputtering method; indium tin films; poly(ethylene naphthalate) (PEN) film; solar cell;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2014.2356332

Filename

6906299