DocumentCode
803345
Title
Theoretical interpretation of the enhanced single-mode stability in extended cavity VCSELs
Author
Riyopoulos, S. ; Unold, H.
Author_Institution
Sci. Applications Int. Corp., McLean, VA, USA
Volume
20
Issue
7
fYear
2002
fDate
7/1/2002 12:00:00 AM
Firstpage
1173
Lastpage
1181
Abstract
Paraxial eigenmode analysis demonstrates that the extended cavity stability follows from the geometric scaling of the diffractive cavity losses; the same principle also explains the narrow aperture stability. Because diffraction losses scale as (L/b)2 = (Lλ/πwo2)2, one can enhance diffraction to differentiate thresholds among modes either by shrinking the mode waist wo (smaller aperture) or by extending the cavity length L. The second approach does not limit the vertical cavity semiconductor laser (VCSEL) output power. Our predictions agree with experimental trends, and suggest that diffraction limited modes apply to extended cavity VCSELs, since guided mode theory (effective index or thermal lensing) does not allow strong stability dependence on cavity length. The extended length stabilization holds when factors other than diffraction (such as mode wing clipping or aperture scattering) significantly contribute to cavity losses.
Keywords
eigenvalues and eigenfunctions; laser cavity resonators; laser modes; laser stability; light diffraction; optical losses; semiconductor lasers; surface emitting lasers; VCSEL output power; aperture scattering; cavity length; cavity losses; diffraction limited modes; diffraction losses; diffractive cavity losses; enhanced single-mode stability; extended cavity VCSELs; extended cavity stability; geometric scaling; guided mode theory; mode waist; mode wing clipping; narrow aperture stability; paraxial eigenmode analysis; strong stability dependence; vertical cavity semiconductor laser; Apertures; Diffraction; Laser modes; Laser theory; Power generation; Power lasers; Semiconductor lasers; Stability analysis; Thermal lensing; Vertical cavity surface emitting lasers;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.2002.800356
Filename
1026388
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