• DocumentCode
    805507
  • Title

    An interchange format for process and device simulation

  • Author

    Duvall, Steven G.

  • Author_Institution
    Intel Corp., Santa Clara, CA, USA
  • Volume
    7
  • Issue
    7
  • fYear
    1988
  • fDate
    7/1/1988 12:00:00 AM
  • Firstpage
    741
  • Lastpage
    754
  • Abstract
    A standard format for transmitting profiles of semiconductor structures between sites and between tools is described. The standard, called the profile interchange format (PIF), is a flexible and hierarchical format, capable of storing descriptions of semiconductor structures such as those produced and used by process and device simulators. It can store detailed descriptions of the geometry, attribute profiles, material properties, and transient behavior of a single structure or a collection of structures. Two equivalent forms of the PIF are proposed to resolve conflicting demands placed on the format by its two primary uses, which are transmitting profiles between sites and local use as a database for process and device simulation. The `intersite´ form of the PIF, which can be viewed as an extension of the electronic design interchange between sites, most importantly, portability. The `intertool´ form of the PIF is, in concept, equivalent in descriptive capabilities to the intersite form, but is intended to accommodate the needs of profile interchange between tools, most importantly, efficient storage and access of data. The PIF in both modes can be extended and modified to accommodate local needs
  • Keywords
    circuit CAD; digital simulation; electronic engineering computing; integrated circuit technology; semiconductor technology; CAD; IC design; attribute profiles; computer aided design; database; device geometry; device simulation; electronic design interchange; hierarchical format; intersite form; intertool; material properties; portability; process simulator; profile interchange format; semiconductor structures; transient behavior; Analytical models; Capacitance; Circuits; Databases; Doping profiles; Geometry; Material properties; Proposals; Semiconductor device testing; Software packages;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/43.3945
  • Filename
    3945