DocumentCode :
805759
Title :
An updated temperature-dependent breakdown coupling model including both impact ionization and tunneling mechanisms for AlGaAs/InGaAs HEMTs
Author :
Li, H. Philip ; Hartin, Olin L. ; Ray, Marcus
Author_Institution :
DigitalDNA, Motorola Inc., Tempe, AZ, USA
Volume :
49
Issue :
9
fYear :
2002
fDate :
9/1/2002 12:00:00 AM
Firstpage :
1675
Lastpage :
1678
Abstract :
An updated model on the temperature dependent two-terminal breakdown mechanisms coupling both impact ionization (II) and thermionic field emission (TFE) for HEMTs is presented in this paper. This model depicts the interplay between TFE and II mechanisms. Examples of temperature dependence of reverse gate current are discussed. It is important that the coupling mechanism between TFE and II at elevated temperature should be considered, particularly when designing devices for high-power applications
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; impact ionisation; indium compounds; power HEMT; semiconductor device breakdown; semiconductor device models; thermionic emission; AlGaAs-InGaAs; AlGaAs/InGaAs HEMTs; elevated temperature; high-power applications; impact ionization; reverse gate current; temperature dependent breakdown coupling model; thermionic field emission; two-terminal breakdown mechanisms; updated model; Current measurement; Electric breakdown; HEMTs; Impact ionization; Indium gallium arsenide; MODFETs; Schottky barriers; Temperature dependence; Thermionic emission; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2002.802651
Filename :
1027866
Link To Document :
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