• DocumentCode
    806017
  • Title

    Improvement of RF Sputtering by Crossed EM Fields

  • Author

    Haden, C.R.

  • Author_Institution
    School of Electrical Engineering, University Of Oklahoma, Norman, Okla 73069.
  • Issue
    4
  • fYear
    1975
  • Firstpage
    549
  • Lastpage
    552
  • Abstract
    A method is described whereby the cathode to ground capacitance of an RF sputtering module may be dramatically reduced, thereby cutting the power loss and improving the efficinecy. The technique uses a dc magnetic field, perpendicular to the RF electric field, thereby producing a cycloidal path for electrons and greatly increasing the extent of the Crookes dark space. It is shown that the applied magnetic field must be great enough to require the cycloidal height to be less than the desired dark space width. Experimental observations are described.
  • Keywords
    Acceleration; Anodes; Capacitance; Cathodes; Dielectrics; Electrodes; Electrons; Plasmas; Radio frequency; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Industrial Electronics and Control Instrumentation, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9421
  • Type

    jour

  • DOI
    10.1109/TIECI.1975.351326
  • Filename
    4159170