DocumentCode
806017
Title
Improvement of RF Sputtering by Crossed EM Fields
Author
Haden, C.R.
Author_Institution
School of Electrical Engineering, University Of Oklahoma, Norman, Okla 73069.
Issue
4
fYear
1975
Firstpage
549
Lastpage
552
Abstract
A method is described whereby the cathode to ground capacitance of an RF sputtering module may be dramatically reduced, thereby cutting the power loss and improving the efficinecy. The technique uses a dc magnetic field, perpendicular to the RF electric field, thereby producing a cycloidal path for electrons and greatly increasing the extent of the Crookes dark space. It is shown that the applied magnetic field must be great enough to require the cycloidal height to be less than the desired dark space width. Experimental observations are described.
Keywords
Acceleration; Anodes; Capacitance; Cathodes; Dielectrics; Electrodes; Electrons; Plasmas; Radio frequency; Sputtering;
fLanguage
English
Journal_Title
Industrial Electronics and Control Instrumentation, IEEE Transactions on
Publisher
ieee
ISSN
0018-9421
Type
jour
DOI
10.1109/TIECI.1975.351326
Filename
4159170
Link To Document