• DocumentCode
    806548
  • Title

    Effects of well number, cavity length, and facet reflectivity on the reduction of threshold current of GaAs/AlGaAs multiquantum well lasers

  • Author

    Kurobe, Atsushi ; Furuyama, Hideto ; Naritsuka, Shigeya ; Sugiyama, Naoharu ; Kokubun, Yoshihiro ; Nakamura, Masaru

  • Author_Institution
    Toshiba Corp., Kawasaki, Japan
  • Volume
    24
  • Issue
    4
  • fYear
    1988
  • fDate
    4/1/1988 12:00:00 AM
  • Firstpage
    635
  • Lastpage
    640
  • Abstract
    The optimum design for reducing the threshold current of GaAs/AlGaAs multiquantum well lasers is determined experimentally. The lowest threshold current density is realized by using single and multiquantum wells at long and short cavity lengths, respectively. The threshold current has a minimum at the optimum cavity length: the minimum threshold current is smaller for a larger number of quantum wells, and the optimum cavity length is inversely proportional to the number of wells. Experiments are compared to the theory developed by P.W.A. McIlroy, et al. (ibid., vol.21, no.12, p.1958-63, 1985) and limiting performances of quantum well lasers with various numbers of wells are presented. The reduction of the threshold current by high reflectivity coatings is also demonstrated, and a threshold current as low as 1.86 mA at 15 degrees C is reported.<>
  • Keywords
    III-V semiconductors; aluminium compounds; current density; gallium arsenide; laser cavity resonators; reflectivity; semiconductor junction lasers; 1.86 mA; 15 degC; GaAs-AlGaAs; GaAs/AlGaAs multiquantum well lasers; III-V semiconductor; cavity length; facet reflectivity; limiting performances; optimum design; single quantum wells; threshold current density; threshold current reduction; well number; Current density; Gallium arsenide; Mirrors; Optical losses; Optical saturation; Quantum well devices; Quantum well lasers; Reflectivity; Semiconductor lasers; Threshold current;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/3.172
  • Filename
    172