• DocumentCode
    807761
  • Title

    Radiation Produced Trapping Effects in Devices-Invited Paper

  • Author

    Oldham, W.G.

  • Author_Institution
    Department of Electrical Engineering and Computer Sciences and the Electronics Research Laboratory University of California, Berkeley, California 94720
  • Volume
    19
  • Issue
    6
  • fYear
    1972
  • Firstpage
    347
  • Lastpage
    354
  • Abstract
    The effects of radiation-produced majority carrier traps in junction space-charge regions are reviewed. The nature of trapping states is discussed, and defect states in the upper half of the bandgap are shown to be dominant in p+n junctions. A number of experimental methods for determining trap parameters are examined, and the results of various experiments compared. Three important levels are found at energies 0.48, 0.38, and 0.2 eV below the conduction band edge. Best estimates of the electron capture cross sections are 2 × 10-14, 4 × 10-15, and 1 × 10-19 cm2 respectively. These levels give rise to frequency dependent small-signal device parameters in junction field-effect transistors, as well as time dependent parameters for large signals. Only very slight trapping effects are found in enhancement-mode MOS transistors; however the effects should be much larger in depletion-mode devices. Trapping effects restrict the application of variable capacitor diodes.
  • Keywords
    Capacitance; Charge carrier processes; Diodes; Electron emission; Electron traps; Energy states; FETs; Frequency dependence; Gold; MOS capacitors;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1972.4326857
  • Filename
    4326857