DocumentCode
807761
Title
Radiation Produced Trapping Effects in Devices-Invited Paper
Author
Oldham, W.G.
Author_Institution
Department of Electrical Engineering and Computer Sciences and the Electronics Research Laboratory University of California, Berkeley, California 94720
Volume
19
Issue
6
fYear
1972
Firstpage
347
Lastpage
354
Abstract
The effects of radiation-produced majority carrier traps in junction space-charge regions are reviewed. The nature of trapping states is discussed, and defect states in the upper half of the bandgap are shown to be dominant in p+n junctions. A number of experimental methods for determining trap parameters are examined, and the results of various experiments compared. Three important levels are found at energies 0.48, 0.38, and 0.2 eV below the conduction band edge. Best estimates of the electron capture cross sections are 2 Ã 10-14, 4 Ã 10-15, and 1 Ã 10-19 cm2 respectively. These levels give rise to frequency dependent small-signal device parameters in junction field-effect transistors, as well as time dependent parameters for large signals. Only very slight trapping effects are found in enhancement-mode MOS transistors; however the effects should be much larger in depletion-mode devices. Trapping effects restrict the application of variable capacitor diodes.
Keywords
Capacitance; Charge carrier processes; Diodes; Electron emission; Electron traps; Energy states; FETs; Frequency dependence; Gold; MOS capacitors;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1972.4326857
Filename
4326857
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