A study on the field distribution of thin-film heads

Author

Takano, Hisashi ; Shinada, Hiroyuki ; Seitou, Shigemitsu ; Fukuhara, Satoru ; Ohnishi, Tsuyoshi ; Otomo, Shigekazu ; Todokoro, Hideo ; Shiiki, Kazuo

Author_Institution

Hitachi Ltd., Tokyo, Japan

Volume

28

Issue

2

fYear

1992

fDate

3/1/1992 12:00:00 AM

Firstpage

1024

Lastpage

1030

Abstract

The field distribution of a thin-film inductive head and its relationship to pole configurations are examined. Three components of the field distribution at high frequencies are measured using a newly developed electron beam tomography method. Focused ion beam etching is used for the processing of the pole configuration. A comparison between the measured field distribution and the results of three-dimensional computer simulation shows that a sharp field distribution suitable for high-density recording is produced to promote magnetization at the tip region. Furthermore, the optimum design of the pole configuration clarifies the feasibility of 1-μm track recording

Keywords

computerised tomography; digital simulation; electron beam applications; magnetic field measurement; magnetic heads; magnetic recording; magnetic thin film devices; 1 micron; electron beam tomography method; field distribution; focused ion beam etching; high-density recording; magnetization; pole configuration optimum design; thin-film inductive head; three-dimensional computer simulation; Computer simulation; Electron beams; Etching; Frequency measurement; Ion beams; Magnetic field measurement; Magnetic heads; Magnetization; Tomography; Transistors;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.123855

Filename

123855