DocumentCode :
808654
Title :
Fabrication of silicon strip detectors using a step-and-repeat lithography system
Author :
Holland, S.
Author_Institution :
Lawrence Berkeley Lab., California Univ., CA, USA
Volume :
39
Issue :
5
fYear :
1992
fDate :
10/1/1992 12:00:00 AM
Firstpage :
1259
Lastpage :
1262
Abstract :
The use of a step-and-repeat lithography system (stepper) for the fabrication of silicon detectors is described. A technique was used which overcomes the field size limitation and allows fabrication of large-area strip detectors with a wafer stepper. This technique essentially consists of the precise, repetitive placement of strip patterns on the wafer. Prototype detectors using this method have been fabricated and tested. In addition to the inherent advantages of a step-and-repeat system, this technique offers great flexibility in the fabrication of large-area strip detectors since the length and width of the detector can be changed by simply reprogramming the stepper computer. The technique is presented, followed by experimental results from the first prototype
Keywords :
elemental semiconductors; semiconductor counters; silicon; Si; field size limitation; large-area strip detectors; step-and-repeat lithography system; stepper; strip patterns; wafer stepper; Detectors; Geometry; Laboratories; Leakage current; Lenses; Lithography; Optical device fabrication; Printing; Silicon; Strips;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.173187
Filename :
173187
Link To Document :
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