• DocumentCode
    810773
  • Title

    A Silicon Micromachined f - \\theta Microlens Scanner Array by Double-Deck Device Design Techniq

  • Author

    Takahashi, Kazuhiro ; Kwon, Ho Nam ; Mita, Makoto ; Saruta, Kunihiko ; Lee, Jong-Hyun ; Fujita, Hiroyuki ; Toshiyoshi, Hiroshi

  • Author_Institution
    Inst. of Ind. Sci., Univ. of Tokyo
  • Volume
    13
  • Issue
    2
  • fYear
    2007
  • Firstpage
    277
  • Lastpage
    282
  • Abstract
    In this paper, we report an array of f- thetas microlens optical scanners developed for 3-D optical cross connect (OXC) system using the bulk-silicon micromachining technique. An electrostatic XY-stage mechanism for the 2-D lens scanner was designed to have a small footprint (2 mmtimes2 mm), compared with an integrated silicon lens (diameter 1 mm) due to the newly developed double-deck actuator design; all the mechanical parts (suspensions and frames) were made in the substrate layer of a silicon-on-insulator (SOI) wafer, and the electrostatic actuation mechanism (electrodes and electrical interconnection) was made in the SOI layer. A silicon lens was integrated on top of the XY-stage by transferring the spherical profile of a thermal-reflow photoresist pattern into the SOI layer by reactive-ion etching. The XY lens scanner was found to operate at lateral displacement of 19 mum in the X-directions and 23 mum in the Y-directions at drive voltages of 110 and 60 V, respectively. For an optical assembly of the OXC, we used additional lenses in a telescope formation to double the beam angle that was steered by the f- thetas microlens scanner by which the lens displacement could be designed to be smaller by a factor of 1/2
  • Keywords
    beam steering; integrated optoelectronics; micro-optomechanical devices; microactuators; microlenses; micromachining; optical arrays; optical design techniques; optical fabrication; optical interconnections; optical scanners; photoresists; silicon; sputter etching; 110 V; 2 mm; 60 V; Si-SiO2; XY lens scanner; beam steering; double-deck actuator design; double-deck device design; electrical interconnection; electrodes; electrostatic XY-stage mechanism; electrostatic actuation; f-thetas microlens optical scanner; integrated silicon lens; lens displacement; microlens scanner array; optical assembly; reactive-ion etching; silicon micromachining; silicon-on-insulator layer; silicon-on-insulator wafer; spherical profile; substrate layer; telescope formation; thermal-reflow photoresist pattern; three-dimensional optical crossconnect; two-dimensional lens scanner; Electrodes; Electrostatic actuators; Lenses; Micromachining; Microoptics; Optical arrays; Optical design; Silicon on insulator technology; Suspensions; Thermal lensing; Microelectromechanical system (MEMS); XY-stage; microlens; optical cross connect (OXC); topologically layer switching architecture;
  • fLanguage
    English
  • Journal_Title
    Selected Topics in Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    1077-260X
  • Type

    jour

  • DOI
    10.1109/JSTQE.2007.893099
  • Filename
    4159999