DocumentCode :
810796
Title :
Arrays of High Tilt-Angle Micromirrors for Multiobject Spectroscopy
Author :
Waldis, Severin ; Zamkotsian, Frederic ; Clerc, Pierre-Andre ; Noell, Wilfried ; Zickar, Michael ; De Rooij, Nico
Author_Institution :
Inst. of Microtechnol., Neuchatel Univ.
Volume :
13
Issue :
2
fYear :
2007
Firstpage :
168
Lastpage :
176
Abstract :
Micromirror arrays are promising components for generating reflective slit masks in future multiobject spectrographs. The micromirrors, 100 mum times200 mum in size, are etched in bulk single crystal silicon, whereas a hidden suspension is realized by surface micromachining. The micromirrors are actuated electrostatically by electrodes located on a second chip. The use of silicon on insulator (SOI) wafers for both mirror and electrode chip ensures thermal compatibility for cryogenic operation. A system of multiple landing beams has been developed, which latches the mirror at a well-defined tilt angle when actuated. Arrays of 5times5 micromirrors have been realized. The tilt angle obtained is 20deg at a pull-in voltage of 90 V. Measurements with an optical profiler showed that the tilt angle of the actuated and locked mirror is stable with a precision of 1 arcmin over a range of 15 V. This locking system makes the tilt angle independent from process variations across the wafer and, thus, provides uniform tilt angle over the whole array. The surface quality of the mirrors in actuated state is better than 10-nm peak to valley and the local roughness is about 1-nm root mean square
Keywords :
cryogenics; electrodes; electrostatic actuators; etching; infrared spectroscopy; micro-optomechanical devices; micromachining; micromirrors; optical arrays; optical design techniques; optical fabrication; silicon; silicon-on-insulator; surface roughness; suspensions; 100 mum; 15 V; 200 mum; 90 V; Si-SiO2; actuated mirror; bulk single crystal silicon; cryogenic operation; electrode chips; electrodes; electrostatic actuation; etching; hidden suspension; high tilt-angle micromirrors; local roughness; locked mirror; micromirror arrays; microoptoelectromechanical systems; multiobject spectroscopy; multiple landing beams; near-infrared multiobject spectrograph; optical profiler; reflective slit masks; silicon on insulator wafer; surface micromachining; surface quality; thermal compatibility; Cryogenics; Electrodes; Etching; Micromachining; Micromirrors; Mirrors; Optical arrays; Silicon on insulator technology; Spectroscopy; Voltage; Deep reactive-ion etch (DRIE); micromirror; microoptoelectromechanical system (MOEMS); mirror array; multiobject spectroscopy (MOS);
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2007.894181
Filename :
4160000
Link To Document :
بازگشت