• DocumentCode
    810989
  • Title

    Intrinsic Mismatch Between Floating-Gate Nonvolatile Memory Cell and Equivalent Transistor

  • Author

    Duane, Russell ; Rafhay, Quentin ; Beug, M. Florian ; Van Duuren, Michiel

  • Author_Institution
    Tyndall Nat. Inst., Cork
  • Volume
    28
  • Issue
    5
  • fYear
    2007
  • fDate
    5/1/2007 12:00:00 AM
  • Firstpage
    440
  • Lastpage
    442
  • Abstract
    The matching performance of nonvolatile memory cells and their equivalent transistors is investigated using a novel matching-performance factor. Extensive measurements on three technologies show that matching pairs can be found, but there is an inherent mobility mismatch between the equivalent transistor and the memory cell. It is suggested that the cause of this mismatch is due to the necessary layout differences between the cell and the equivalent transistor that can cause different levels of plasma-induced damage in the structures
  • Keywords
    random-access storage; equivalent transistor; floating-gate nonvolatile memory cell; intrinsic mismatch; matching performance; mobility mismatch; plasma charging; plasma-induced damage; Analytical models; Capacitance; Helium; Length measurement; MOSFET circuits; Nonvolatile memory; Performance analysis; Plasma applications; Plasma devices; Testing; Nonvolatile memory devices; plasma charging; test structure;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2007.895434
  • Filename
    4160017