DocumentCode
810989
Title
Intrinsic Mismatch Between Floating-Gate Nonvolatile Memory Cell and Equivalent Transistor
Author
Duane, Russell ; Rafhay, Quentin ; Beug, M. Florian ; Van Duuren, Michiel
Author_Institution
Tyndall Nat. Inst., Cork
Volume
28
Issue
5
fYear
2007
fDate
5/1/2007 12:00:00 AM
Firstpage
440
Lastpage
442
Abstract
The matching performance of nonvolatile memory cells and their equivalent transistors is investigated using a novel matching-performance factor. Extensive measurements on three technologies show that matching pairs can be found, but there is an inherent mobility mismatch between the equivalent transistor and the memory cell. It is suggested that the cause of this mismatch is due to the necessary layout differences between the cell and the equivalent transistor that can cause different levels of plasma-induced damage in the structures
Keywords
random-access storage; equivalent transistor; floating-gate nonvolatile memory cell; intrinsic mismatch; matching performance; mobility mismatch; plasma charging; plasma-induced damage; Analytical models; Capacitance; Helium; Length measurement; MOSFET circuits; Nonvolatile memory; Performance analysis; Plasma applications; Plasma devices; Testing; Nonvolatile memory devices; plasma charging; test structure;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2007.895434
Filename
4160017
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