• DocumentCode
    811552
  • Title

    User experience with wiring methods and materials in industrial facilities of the United States and Canada

  • Author

    Gallagher, John M. ; Grant, Dean C. ; Mcclung, L. Bruce

  • Author_Institution
    Novacor Chem. Ltd., Sarnia, Ont., Canada
  • Volume
    24
  • Issue
    6
  • fYear
    1988
  • Firstpage
    1168
  • Lastpage
    1179
  • Abstract
    The authors discuss the various wiring alternatives in industrial facilities of the United States and Canada. Specific mention is made of the fact that almost simultaneously an armored `TECK´ cable was being developed and applied in Canada and a nonmetallic sheathed `TC´ cable was being developed and applied in the United States. Both types can be utilized in cabletroughs or cable trays in General Purpose and Class I or II, Division 2 Electrical Hazardous Locations. It is noted that the TECK cable does meet more stringent cold-bend and cold-impact conditions as well as more stringent crush tests. Thus, it can also be utilized in Class I or II, Division 1 and Class III, Divisions 1 and 2 Electrical Hazardous Locations, and it can be installed in low-level routings without additional protection or even supported without raceway. It is concluded that both concepts have merits and should be recognized and it is concluded that they are appropriate for use in industrial facilities that are inaccessible to the public and that are serviced by qualified persons
  • Keywords
    cable sheathing; electric conduits; power cables; Canada; Electrical Hazardous Locations; United States; armoured TECK cable; cable trays; cabletroughs; cold-bend conditions; cold-impact conditions; crush tests; industrial facilities; low-level routings; nonmetallic sheathed TC cable; wiring methods; Buildings; Cable insulation; Chemical industry; Conducting materials; Industrial plants; National electric code; Power cables; Protection; Wire; Wiring;
  • fLanguage
    English
  • Journal_Title
    Industry Applications, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-9994
  • Type

    jour

  • DOI
    10.1109/28.17493
  • Filename
    17493