Real-time statistical process control using tool data [semiconductor manufacturing]

Author

Spanos, Costas J. ; Guo, Hai-Fang ; Miller, Alan ; Levine-Parrill, Joanne

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA

Volume

5

Issue

4

fYear

1992

fDate

11/1/1992 12:00:00 AM

Firstpage

308

Lastpage

318

Abstract

A process monitoring scheme that takes advantage of real-time information in order to generate malfunction alarms is described. This is accomplished with the application of time-series filtering and multivariate statistical process control. This scheme is capable of generating alarms on a true real-time basis, while the wafer is still in the processing chamber. Several examples are presented with tool data collected from the SECSII port of single-wafer plasma etchers

Keywords

computerised monitoring; integrated circuit manufacture; manufacturing data processing; real-time systems; semiconductor device manufacture; statistical analysis; statistical process control; SECSII port; SPC; malfunction alarms; multivariate statistical process control; process monitoring scheme; real-time information; semiconductor manufacturing; semiconductor wafers; single-wafer plasma etchers; time-series filtering; Condition monitoring; Conductors; Control charts; Filtering; Manufacturing processes; Plasma applications; Plasma temperature; Process control; Semiconductor device manufacture; Valves;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/66.175363

Filename

175363