• DocumentCode
    815012
  • Title

    Crosstalk-based capacitance measurements: theory and applications

  • Author

    Vendrame, Lori ; Bortesi, Luca ; Cattane, Fabrizio ; Bogliolo, Allessandro

  • Author_Institution
    FTM Adv. R&D, STMicroelectronics, Agrate Brianza, Italy
  • Volume
    19
  • Issue
    1
  • fYear
    2006
  • Firstpage
    67
  • Lastpage
    77
  • Abstract
    Geometry scaling increases the relative effect of coupling capacitances on performance, power, and noise so that they need to be carefully taken into account during process development, characterization, and monitoring. In the last decade, charge-based capacitance measurements (CBCMs) have been widely used to estimate on-chip wiring and coupling capacitances because of their accuracy and simplicity. We provide a thorough theoretical and experimental study of CBCMs applied to the selective extraction of cross-coupling capacitances. We take a historical perspective starting from the original CBCM approach proposed by Chen in 1996, and we present a new technique for crosstalk-based capacitance measurements (CTCMs). CTCMs improve the accuracy and usability of CBCMs while reducing the complexity of the test structures. We present the theory of CTCM, we provide experimental results demonstrating its improved accuracy, and we discuss its application to a wide range of process monitoring and testing tasks. Experimental results are used throughout the paper to support the discussion.
  • Keywords
    capacitance measurement; integrated circuit measurement; joining processes; process monitoring; charge-based capacitance measurements; cross-coupling capacitances; geometry scaling; interconnect capacitance; monitoring; on-chip wiring; test structure; Capacitance measurement; Circuit testing; Crosstalk; Dielectrics; Integrated circuit interconnections; Integrated circuit technology; MIM capacitors; Monitoring; Usability; Wiring; Cross-coupling capacitance; interconnect capacitance; matching; process monitoring; test structure;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2005.863263
  • Filename
    1588864