• DocumentCode
    815326
  • Title

    Silica buried channel waveguides fabricated at low temperature using PECVD

  • Author

    Durandet, A. ; Perry, A. ; Boswell, R. ; Ladouceur, F. ; Love, J. ; Faith, M. ; Kemeny, P. ; Ma, X. ; Austin, M.

  • Author_Institution
    Plasma Res. Lab., Australian Nat. Univ., Canberra, ACT, Australia
  • Volume
    32
  • Issue
    4
  • fYear
    1996
  • fDate
    2/15/1996 12:00:00 AM
  • Firstpage
    326
  • Lastpage
    327
  • Abstract
    Buried channel waveguides made of silica films deposited on silicon substrates have been fabricated at low temperature (<100°C) without thermal annealing using the Helicon plasma deposition technique. The guides have losses as low as 1 dB/cm. A 1×8 splitter comprising concatenated Y-junctions has been fabricated and characterised
  • Keywords
    optical fabrication; optical losses; optical planar waveguides; plasma CVD; silicon; silicon compounds; 1×8 splitter; Helicon plasma deposition technique; PECVD; Si; SiO2-Si; buried channel waveguides; concatenated Y-junctions; losses; low temperature fabrication;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19960254
  • Filename
    490948
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=815326