Title :
Compact integrated silica wavelength filters
Author :
Morgan, Christopher N. ; Yu, Siyuan ; Penty, Richard V. ; White, Ian H.
Author_Institution :
Dept. of Eng., Cambridge Univ., UK
Abstract :
The realization of compact low-loss wavelength filters using two-dimensional integrated optics (2DIO) in a silica-on-silica material system is reported. Two designs suitable for data-communications applications are reported: a 4 /spl times/ 4 channel 6.4-nm channel wavelength spacing device and an 8 /spl times/ 8 channel 3.2-nm channel wavelength spacing device. The devices are fabricated in one deep etch step, and after cleaving the four-channel device has a footprint of 4 /spl times/ 3 min and the eight-channel device 8 /spl times/ 6.5 mm. The average crosstalk of the devices is >22 dB for adjacent channels and 26 dB for nonadjacent channels, and their fiber-to-fiber insertion losses are <12 dB.
Keywords :
optical communication equipment; optical crosstalk; optical fabrication; optical losses; optical planar waveguides; optical waveguide filters; photolithography; silicon compounds; sputter etching; wavelength division multiplexing; anisotropic RIE process; average crosstalk; channel wavelength spacing device; cleaving; compact low-loss wavelength filters; coupling loss; deep etch step; demultiplexer devices; eight-channel device; fiber-to-fiber insertion losses; four-channel device; loss figure; on-chip loss; photolithographic exposure; silica-on-silica system; slab structure; transmission-reflection linear grating; two-dimensional integrated optics; wavelength-division multiplexing; Arrayed waveguide gratings; Costs; Crosstalk; Etching; Integrated optics; Optical filters; Optical materials; Polymers; Silicon compounds; Wavelength division multiplexing;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2002.800728
