Title :
Effects of ionizing radiation on the noise properties of DMOS power transistors
Author :
Babcock, J.A. ; Titus, J.L. ; Schrimpf, R.D. ; Galloway, K.F.
fDate :
12/1/1991 12:00:00 AM
Abstract :
The 1/f noise properties of DMOS (double-diffused MOS) power transistors were examined as a function of total ionizing dose. The results indicate that radiation causes significant changes in the frequency dependence of the noise of the power MOSFETs studied. Before exposure to radiation, the noise power spectral density indicated a 1/ fλ relationship where λ ranged from approximately 0.5 to 1.0. As the total dose level increased. λ approached unity, while the magnitude of the noise increased proportionally with the radiation-induced charge density. In addition, noise measurements were performed after irradiation, while the devices were annealing under a ±12 V bias. It was found that, under the +12 V bias, λ increased and under the -12 V bias, λ decreased. Finally, no correlation was found between the pre-irradiation 1/f noise magnitude and the radiation hardness of these DMOS power transistors
Keywords :
annealing; electron device noise; insulated gate field effect transistors; power transistors; radiation effects; radiation hardening (electronics); 1/f noise properties; DMOS power transistors; annealing; ionizing radiation effects; noise measurements; noise properties; power MOSFETs; radiation hardness; radiation-induced charge density; total ionizing dose; Annealing; Degradation; Ionizing radiation; Low-frequency noise; MOSFETs; Noise measurement; Power transistors; Semiconductor device noise; Weapons; Working environment noise;
Journal_Title :
Nuclear Science, IEEE Transactions on