• DocumentCode
    81710
  • Title

    Phenomenon of Drain Current Instability on p-GaN Gate AlGaN/GaN HEMTs

  • Author

    Ting-Fu Chang ; Tsung-Chieh Hsiao ; Chih-Fang Huang ; Wei-Hung Kuo ; Suh-Fang Lin ; Samudra, Ganesh S. ; Liang, Yung C.

  • Author_Institution
    Inst. of Electron. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • Volume
    62
  • Issue
    2
  • fYear
    2015
  • fDate
    Feb. 2015
  • Firstpage
    339
  • Lastpage
    345
  • Abstract
    In this paper, an observation of drain current instability on p-GaN gate AlGaN/GaN HEMTs is reported. Contrary to the Schottky gate AlGaN/GaN HEMTs, which show stable and consistent Id-Vd curves under different pulsed conditions, the Id-Vd curves for p-GaN gate AlGaN/GaN HEMTs show a dispersion in the saturation region under the same pulse conditions, which cannot be explained by the trapping of electrons in the material. A model considering the trapping of holes in the p-GaN gate under different gate and drain biases is proposed to explain this new phenomenon.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; AlGaN-GaN; drain current instability; gate HEMT; saturation region; Aluminum gallium nitride; Current measurement; Gallium nitride; HEMTs; Logic gates; MODFETs; Voltage measurement; AlGaN/GaN; HEMT; high voltage; instability; p-GaN gate;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2014.2352276
  • Filename
    6907990