DocumentCode
81710
Title
Phenomenon of Drain Current Instability on p-GaN Gate AlGaN/GaN HEMTs
Author
Ting-Fu Chang ; Tsung-Chieh Hsiao ; Chih-Fang Huang ; Wei-Hung Kuo ; Suh-Fang Lin ; Samudra, Ganesh S. ; Liang, Yung C.
Author_Institution
Inst. of Electron. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Volume
62
Issue
2
fYear
2015
fDate
Feb. 2015
Firstpage
339
Lastpage
345
Abstract
In this paper, an observation of drain current instability on p-GaN gate AlGaN/GaN HEMTs is reported. Contrary to the Schottky gate AlGaN/GaN HEMTs, which show stable and consistent Id-Vd curves under different pulsed conditions, the Id-Vd curves for p-GaN gate AlGaN/GaN HEMTs show a dispersion in the saturation region under the same pulse conditions, which cannot be explained by the trapping of electrons in the material. A model considering the trapping of holes in the p-GaN gate under different gate and drain biases is proposed to explain this new phenomenon.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; AlGaN-GaN; drain current instability; gate HEMT; saturation region; Aluminum gallium nitride; Current measurement; Gallium nitride; HEMTs; Logic gates; MODFETs; Voltage measurement; AlGaN/GaN; HEMT; high voltage; instability; p-GaN gate;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2014.2352276
Filename
6907990
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