DocumentCode
81735
Title
Physical Models for SiC and Their Application to Device Simulations of SiC Insulated-Gate Bipolar Transistors
Author
Hatakeyama, T. ; Fukuda, Kenji ; Okumura, Hajime
Author_Institution
Adv. Power Electron. Res. Center, Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
Volume
60
Issue
2
fYear
2013
fDate
Feb. 2013
Firstpage
613
Lastpage
621
Abstract
Important physical models for 4H silicon carbide (4H-SiC) are constructed based on the literature and experiments on the physical properties of 4H-SiC. The obtained physical models are implemented into a commercial device simulator, which is used for examining the potential performance of SiC insulated-gate bipolar transistors (IGBTs). Device simulation using these new physical models shows that the forward characteristics of the conventional type of planar SiC IGBTs are significantly poorer than those of SiC p-i-n diodes, even if the carrier lifetime is improved. It is shown that the degradation in the characteristics of the conventional SiC IGBT is caused by the limited conduction modulation at the cathode side of the n-base layer. We show that this problem can be resolved by applying device structures that induce a hole-barrier effect in the SiC IGBTs.
Keywords
carrier lifetime; insulated gate bipolar transistors; semiconductor device models; silicon compounds; 4H silicon carbide; SiC; carrier lifetime; cathode side conduction modulation; device simulations; device simulator; hole-barrier effect; n-base layer; physical models; planar silicon carbide IGBT; silicon carbide insulated-gate bipolar transistors; silicon carbide p-i-n diodes; Anisotropic magnetoresistance; Effective mass; Impact ionization; Insulated gate bipolar transistors; Semiconductor process modeling; Silicon carbide; Temperature dependence; 4H-SiC; Diodes; MOSFET; insulated gate bipolar transistors; power semiconductor devices; semiconductor device modeling; wide band gap semiconductors;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2012.2226590
Filename
6365802
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