• DocumentCode
    820319
  • Title

    Lateral Ordering, Position, and Number Control of Self-Organized Quantum Dots: The Key to Future Functional Nanophotonic Devices

  • Author

    Nötzel, Richard ; Sritirawisarn, Nut ; Selçuk, Ekber ; Anantathanasarn, Sanguan

  • Author_Institution
    Res. Inst. on Commun. Technol., Eindhoven Univ. of Technol., Eindhoven
  • Volume
    14
  • Issue
    4
  • fYear
    2008
  • Firstpage
    1140
  • Lastpage
    1149
  • Abstract
    Lateral ordering, position, and number control of self-organized epitaxial semiconductor quantum dots (QDs) are demonstrated. Straight linear InAs QD arrays are formed by self- organized anisotropic strain engineering of an InGaAsP/InP (10 0) superlattice template in chemical beam epitaxy. The QD emission wavelength at room temperature is tuned into the important 1.55 mum telecom wavelength region through the insertion of ultrathin GaAs interlayers. Guided self-organized anisotropic strain engineering is demonstrated on shallow- and deep-patterned GaAs (3 1 1)B substrates by molecular beam epitaxy for the formation of complex InGaAs QD arrays. Lateral positioning and number control of InAs QDs, down to a single QD, are demonstrated on truncated InP (100) pyramids by selective-area metal-organic vapor phase epitaxy. Sharp emission around 1.55 mum is observed well above liquid nitrogen temperatures. The regrowth of a passive waveguide structure establishes submicrometer-scale active- passive integration. The demonstrated control over QD formation is the key to future functional nanophotonic devices and paves the way toward the ultimates of photonic-integrated circuits operating at the single and multiple electron and photon level with control of the quantum mechanical and electromagnetic interactions.
  • Keywords
    III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; molecular beam epitaxial growth; optical materials; self-assembly; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum dots; vapour phase epitaxial growth; GaAs; InGaAsP-InP; InGaAsP-InP (100) superlattice template; chemical beam epitaxy; deep-patterned GaAs (311)B substrate; epitaxial semiconductor quantum dots; functional nanophotonic devices; lateral ordering; liquid nitrogen temperatures; molecular beam epitaxy; passive waveguide structure; room temperature emission wavelength; selective-area metal-organic vapor phase epitaxy; self-organized anisotropic strain engineering; shallow-patterned GaAs (311)B substrate; submicrometer-scale active- passive integration; superlattice template; telecom wavelength region; temperature 293 K to 298 K; truncated InP (100) pyramids; ultrathin interlayers; wavelength 1.55 mum; Anisotropic magnetoresistance; Capacitive sensors; Epitaxial growth; Gallium arsenide; Indium phosphide; Molecular beam epitaxial growth; Nanoscale devices; Quantum dots; Telecommunication control; Temperature; Patterned substrate; quantum dot (QD); selective-area growth; self-organization; strain engineering;
  • fLanguage
    English
  • Journal_Title
    Selected Topics in Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    1077-260X
  • Type

    jour

  • DOI
    10.1109/JSTQE.2008.918251
  • Filename
    4582387