DocumentCode
820319
Title
Lateral Ordering, Position, and Number Control of Self-Organized Quantum Dots: The Key to Future Functional Nanophotonic Devices
Author
Nötzel, Richard ; Sritirawisarn, Nut ; Selçuk, Ekber ; Anantathanasarn, Sanguan
Author_Institution
Res. Inst. on Commun. Technol., Eindhoven Univ. of Technol., Eindhoven
Volume
14
Issue
4
fYear
2008
Firstpage
1140
Lastpage
1149
Abstract
Lateral ordering, position, and number control of self-organized epitaxial semiconductor quantum dots (QDs) are demonstrated. Straight linear InAs QD arrays are formed by self- organized anisotropic strain engineering of an InGaAsP/InP (10 0) superlattice template in chemical beam epitaxy. The QD emission wavelength at room temperature is tuned into the important 1.55 mum telecom wavelength region through the insertion of ultrathin GaAs interlayers. Guided self-organized anisotropic strain engineering is demonstrated on shallow- and deep-patterned GaAs (3 1 1)B substrates by molecular beam epitaxy for the formation of complex InGaAs QD arrays. Lateral positioning and number control of InAs QDs, down to a single QD, are demonstrated on truncated InP (100) pyramids by selective-area metal-organic vapor phase epitaxy. Sharp emission around 1.55 mum is observed well above liquid nitrogen temperatures. The regrowth of a passive waveguide structure establishes submicrometer-scale active- passive integration. The demonstrated control over QD formation is the key to future functional nanophotonic devices and paves the way toward the ultimates of photonic-integrated circuits operating at the single and multiple electron and photon level with control of the quantum mechanical and electromagnetic interactions.
Keywords
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; molecular beam epitaxial growth; optical materials; self-assembly; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum dots; vapour phase epitaxial growth; GaAs; InGaAsP-InP; InGaAsP-InP (100) superlattice template; chemical beam epitaxy; deep-patterned GaAs (311)B substrate; epitaxial semiconductor quantum dots; functional nanophotonic devices; lateral ordering; liquid nitrogen temperatures; molecular beam epitaxy; passive waveguide structure; room temperature emission wavelength; selective-area metal-organic vapor phase epitaxy; self-organized anisotropic strain engineering; shallow-patterned GaAs (311)B substrate; submicrometer-scale active- passive integration; superlattice template; telecom wavelength region; temperature 293 K to 298 K; truncated InP (100) pyramids; ultrathin interlayers; wavelength 1.55 mum; Anisotropic magnetoresistance; Capacitive sensors; Epitaxial growth; Gallium arsenide; Indium phosphide; Molecular beam epitaxial growth; Nanoscale devices; Quantum dots; Telecommunication control; Temperature; Patterned substrate; quantum dot (QD); selective-area growth; self-organization; strain engineering;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2008.918251
Filename
4582387
Link To Document