DocumentCode
823498
Title
Development of Penning Multiply Charged Ion Sources for the Unilac
Author
Schulte, H. ; Jacoby, W. ; Wolf, B.H.
Author_Institution
GSI Gesellschaft fÿr Schwerionenforschung mbH, Darmstadt/Fed. Rep. Germany
Volume
23
Issue
2
fYear
1976
fDate
4/1/1976 12:00:00 AM
Firstpage
1042
Lastpage
1048
Abstract
Two types of PIG sources suitable for generation of multiply charged metal ions are currently under investigation on the test bench: One is a Dubna type source equipped with a sputtering electrode similar to Tretyakov´s design. The central part of the anode is run very hot to achieve effective re-evaporation of the sputtered material. Furthermore, source feed by use of ovens has been applied. The other source uses plasma-heated cathodes, and sputtering electrodes of cylindrical shape surrounding the plasma column almost entirely. For both source types, Ar is preferred as support gas; the content of metal ions in the total extracted current ranges from approx. 10 % up to 80 %, depending on source type and metal species. Among other ions, Ta10+, Au9+, Bi10+ and U11+ have been obtained.
Keywords
Anodes; Cathodes; Electrodes; Feeds; Ion sources; Ovens; Plasma materials processing; Plasma sources; Sputtering; Testing;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1976.4328400
Filename
4328400
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