• DocumentCode
    823498
  • Title

    Development of Penning Multiply Charged Ion Sources for the Unilac

  • Author

    Schulte, H. ; Jacoby, W. ; Wolf, B.H.

  • Author_Institution
    GSI Gesellschaft fÿr Schwerionenforschung mbH, Darmstadt/Fed. Rep. Germany
  • Volume
    23
  • Issue
    2
  • fYear
    1976
  • fDate
    4/1/1976 12:00:00 AM
  • Firstpage
    1042
  • Lastpage
    1048
  • Abstract
    Two types of PIG sources suitable for generation of multiply charged metal ions are currently under investigation on the test bench: One is a Dubna type source equipped with a sputtering electrode similar to Tretyakov´s design. The central part of the anode is run very hot to achieve effective re-evaporation of the sputtered material. Furthermore, source feed by use of ovens has been applied. The other source uses plasma-heated cathodes, and sputtering electrodes of cylindrical shape surrounding the plasma column almost entirely. For both source types, Ar is preferred as support gas; the content of metal ions in the total extracted current ranges from approx. 10 % up to 80 %, depending on source type and metal species. Among other ions, Ta10+, Au9+, Bi10+ and U11+ have been obtained.
  • Keywords
    Anodes; Cathodes; Electrodes; Feeds; Ion sources; Ovens; Plasma materials processing; Plasma sources; Sputtering; Testing;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1976.4328400
  • Filename
    4328400