DocumentCode :
826396
Title :
Explaining strain [in silicon]
Author :
Keyes, Robert W.
Author_Institution :
Div. of Res., IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Volume :
18
Issue :
5
fYear :
2002
fDate :
9/1/2002 12:00:00 AM
Firstpage :
36
Lastpage :
39
Abstract :
Large effects of elastic strain on the electrical resistance of silicon were discovered not long after the recognition of silicon as the material for the development of solid-state electronics. The effects were shortly employed as the basis of a variety of mechanical sensors. More recently, the use of strain to improve the performance of field-effect transistors (FETs) has drawn increased attention to its role as a part of the arsenal of silicon electronic technology. Attention to unwanted strain as a source of problems is also increasing. This article is aimed at explaining the basis of the effects of strain on the electrical properties of n-silicon and how these effects produce both good and bad results.
Keywords :
band structure; carrier mobility; electrical conductivity; elemental semiconductors; semiconductor thin films; silicon; strain sensors; FETs; elastic strain; electrical properties; electrical resistance; n-Si; solid-state electronics; Capacitive sensors; Circuits; Conductivity; Electrons; Force sensors; Lattices; Mechanical sensors; Silicon alloys; Strain measurement; Substrates;
fLanguage :
English
Journal_Title :
Circuits and Devices Magazine, IEEE
Publisher :
ieee
ISSN :
8755-3996
Type :
jour
DOI :
10.1109/MCD.2002.1035350
Filename :
1035350
Link To Document :
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