• DocumentCode
    829013
  • Title

    Silicon carbide UV photodiodes

  • Author

    Brown, Dale M. ; Downey, Evan T. ; Ghezzo, Mario ; Kretchmer, W. ; Saia, Richard J. ; Liu, Yung S. ; Edmond, John A. ; Gati, George ; Pimbley, Joseph M. ; Schneider, William E.

  • Author_Institution
    General Electric Co., Schenectady, NY, USA
  • Volume
    40
  • Issue
    2
  • fYear
    1993
  • fDate
    2/1/1993 12:00:00 AM
  • Firstpage
    325
  • Lastpage
    333
  • Abstract
    SiC photodiodes were fabricated using 6 H single-crystal wafers. These devices have excellent UV responsivity characteristics and very low dark current even at elevated temperatures. The reproducibility is excellent and the characteristics agree with theoretical calculations for different device designs. The advantages of these diodes are that they will operate at high temperatures and are responsive between 200 and 400 nm and not responsive to longer wavelengths because of the wide 3-eV bandgap. The responsivity at 270 nm is between 70% and 85%. Dark-current levels have been measured as a function of temperature that are orders of magnitude below those previously reported. Thus, these diodes can be expected to have excellent performance characteristics for detection of low light level UV even at elevated temperatures
  • Keywords
    leakage currents; photodiodes; semiconductor materials; short-circuit currents; silicon compounds; ultraviolet detectors; 200 to 400 nm; 6H epitaxial layers; SiC photodiodes; UV responsivity characteristics; low dark current; low light level UV detection; quantum efficiency; reproducibility; reverse current leakage; short circuit output current; Artificial intelligence; Crystallization; Dark current; Diodes; Epitaxial layers; Photodiodes; Photonic band gap; Silicon carbide; Substrates; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.182509
  • Filename
    182509