DocumentCode :
832679
Title :
Transport and Deposition of Plasma-Sputtered Platinum Atoms: Comparison Between Experiments and Simulation
Author :
Caillard, Ameal ; Charles, Christine ; Boswell, Rod W. ; Brault, Pascal
Author_Institution :
Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT
Volume :
36
Issue :
4
fYear :
2008
Firstpage :
884
Lastpage :
885
Abstract :
The deposition of platinum atoms by argon plasma sputtering has been simulated by using a 3-D Monte Carlo simulation called Sputtered Particles Transport in Gas, which provides spatial and energy distributions of the Pt atoms impinging on the substrate and on the chamber walls. The Yamamura formula provides the Pt sputtering yield from argon ions, whereas the initial energy distribution of sputtered atoms is given by the Thompson distribution. The Pt flux on the chamber walls and on the substrate are compared with experimental deposition rates.
Keywords :
Monte Carlo methods; metallic thin films; plasma deposition; plasma simulation; platinum; sputter deposition; 3-D Monte Carlo simulation; Pt; Thompson distribution; Yamamura formula; argon plasma sputtering; platinum atom deposition; sputtered atom energy distribution; sputtered particles transport in gas; Argon; Atomic layer deposition; Plasma applications; Plasma materials processing; Plasma simulation; Plasma transport processes; Platinum; Silicon; Sputtering; Substrates; Deposition; Monte Carlo; plasma sputtering; platinum;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2008.924421
Filename :
4598943
Link To Document :
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