• DocumentCode
    832679
  • Title

    Transport and Deposition of Plasma-Sputtered Platinum Atoms: Comparison Between Experiments and Simulation

  • Author

    Caillard, Ameal ; Charles, Christine ; Boswell, Rod W. ; Brault, Pascal

  • Author_Institution
    Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT
  • Volume
    36
  • Issue
    4
  • fYear
    2008
  • Firstpage
    884
  • Lastpage
    885
  • Abstract
    The deposition of platinum atoms by argon plasma sputtering has been simulated by using a 3-D Monte Carlo simulation called Sputtered Particles Transport in Gas, which provides spatial and energy distributions of the Pt atoms impinging on the substrate and on the chamber walls. The Yamamura formula provides the Pt sputtering yield from argon ions, whereas the initial energy distribution of sputtered atoms is given by the Thompson distribution. The Pt flux on the chamber walls and on the substrate are compared with experimental deposition rates.
  • Keywords
    Monte Carlo methods; metallic thin films; plasma deposition; plasma simulation; platinum; sputter deposition; 3-D Monte Carlo simulation; Pt; Thompson distribution; Yamamura formula; argon plasma sputtering; platinum atom deposition; sputtered atom energy distribution; sputtered particles transport in gas; Argon; Atomic layer deposition; Plasma applications; Plasma materials processing; Plasma simulation; Plasma transport processes; Platinum; Silicon; Sputtering; Substrates; Deposition; Monte Carlo; plasma sputtering; platinum;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2008.924421
  • Filename
    4598943