DocumentCode
832679
Title
Transport and Deposition of Plasma-Sputtered Platinum Atoms: Comparison Between Experiments and Simulation
Author
Caillard, Ameal ; Charles, Christine ; Boswell, Rod W. ; Brault, Pascal
Author_Institution
Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT
Volume
36
Issue
4
fYear
2008
Firstpage
884
Lastpage
885
Abstract
The deposition of platinum atoms by argon plasma sputtering has been simulated by using a 3-D Monte Carlo simulation called Sputtered Particles Transport in Gas, which provides spatial and energy distributions of the Pt atoms impinging on the substrate and on the chamber walls. The Yamamura formula provides the Pt sputtering yield from argon ions, whereas the initial energy distribution of sputtered atoms is given by the Thompson distribution. The Pt flux on the chamber walls and on the substrate are compared with experimental deposition rates.
Keywords
Monte Carlo methods; metallic thin films; plasma deposition; plasma simulation; platinum; sputter deposition; 3-D Monte Carlo simulation; Pt; Thompson distribution; Yamamura formula; argon plasma sputtering; platinum atom deposition; sputtered atom energy distribution; sputtered particles transport in gas; Argon; Atomic layer deposition; Plasma applications; Plasma materials processing; Plasma simulation; Plasma transport processes; Platinum; Silicon; Sputtering; Substrates; Deposition; Monte Carlo; plasma sputtering; platinum;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2008.924421
Filename
4598943
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