DocumentCode :
833594
Title :
Power Deposition Profiles in Magnetized Inductively Coupled Plasma
Author :
Lee, Ho-Jun ; Lee, Hae June ; Lim, Wang Sun ; Whang, Ki-Woong
Author_Institution :
Dept. of Electr. Eng., Pusan Nat. Univ., Pusan
Volume :
36
Issue :
4
fYear :
2008
Firstpage :
1394
Lastpage :
1395
Abstract :
Power deposition profiles and spatial distributions of electron density and temperature of magnetized inductively coupled argon plasma are visualized using self-consistent fluid simulation. The model uses Ampere´s law with anisotropic conductivity, particle, and energy conservation equation with anisotropic transport coefficient. Spatial distribution of power absorption shows clear development of cavity mode of low-frequency R wave. More uniform density distribution is found in magnetized discharge than in ordinary inductively coupled discharge. The effects of nonuniform electron density and magnetic flux density are shown.
Keywords :
Rayleigh waves; discharges (electric); electron density; flow simulation; magnetic flux; plasma density; plasma magnetohydrodynamics; plasma simulation; plasma temperature; plasma waves; Ampere law; anisotropic conductivity; anisotropic transport coefficient; cavity mode; electron temperature; energy conservation equation; low-frequency R wave; magnetic flux density; magnetized inductively coupled plasma; nonuniform electron density; power absorption spatial distribution; power deposition profile; self-consistent fluid simulation; uniform density distribution; Anisotropic magnetoresistance; Couplings; Electrons; Magnetic anisotropy; Magnetic flux; Perpendicular magnetic anisotropy; Plasma density; Plasma simulation; Plasma temperature; Plasma transport processes; Cavity mode; R wave; magnetized inductively coupled plasma;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2008.924486
Filename :
4599033
Link To Document :
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