DocumentCode :
833777
Title :
Development and characterization of micromachined hollow cathode plasma display devices
Author :
Chen, Jack ; Park, Sung-Jin ; Fan, Zhifang ; Eden, J. Gary ; Liu, Chang
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
Volume :
11
Issue :
5
fYear :
2002
fDate :
10/1/2002 12:00:00 AM
Firstpage :
536
Lastpage :
543
Abstract :
In this paper, we report the development of hollow cathode micro plasma devices made using micromachining techniques. Compared with larger discharge devices, micromachined discharge devices operate at much higher pressures, up to 1 atm. Linear current-voltage relationships are obtained, potentially simplifying the control electronics for such devices. The size of micromachined discharge units is reduced and the distribution of sizes and light intensity in an array is more uniform relative to previous devices.
Keywords :
cathodes; glow discharges; micromachining; plasma displays; control electronics; hollow cathode plasma display devices; light intensity; linear current-voltage relationships; micromachined discharge devices; micromachining techniques; Acceleration; Associate members; Cathodes; Electrons; Fault location; Glow discharges; Lifting equipment; Plasma devices; Plasma displays; Voltage;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2002.802907
Filename :
1038849
Link To Document :
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