DocumentCode
834510
Title
Radiation Hardened CMOS/SOS Memory Circuits
Author
Haraszti, Tegze P.
Author_Institution
Rockwell International, Electronics Research Center, 3370 Miraloma Avenue, Anaheim, California 92803
Volume
25
Issue
6
fYear
1978
Firstpage
1187
Lastpage
1195
Abstract
Large-scale-integrated circuits which combine radiation hardness with density, high speed and low power dissipation require both hardened processes and hardened circuit design methods. CMOS/SOS circuits featuring self-compensation, self-biasing and parameter tracking accommodate a wide range of nonuniform on-chip parameter variations. These variations result from exposure to a nuclear radiation event, as well as from MOS device processing, temperature and power-supply effects. The circuits discussed in this paper are key elements for radiation-hardened memory designs [up to 106 rads(Si)] with state-of-the-art LSI density and performance. The CMOS/SOS memory cell sizes of 3.1 mil2 for a six-device, and 2.5 mil2 for a four-device, static cell are nearly five times smaller than previous radiation-hardened designs.
Keywords
CMOS memory circuits; Circuit synthesis; Degradation; Ionizing radiation; Leakage current; MOS devices; Neutrons; Photoconductivity; Radiation hardening; Threshold voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1978.4329512
Filename
4329512
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