• DocumentCode
    834510
  • Title

    Radiation Hardened CMOS/SOS Memory Circuits

  • Author

    Haraszti, Tegze P.

  • Author_Institution
    Rockwell International, Electronics Research Center, 3370 Miraloma Avenue, Anaheim, California 92803
  • Volume
    25
  • Issue
    6
  • fYear
    1978
  • Firstpage
    1187
  • Lastpage
    1195
  • Abstract
    Large-scale-integrated circuits which combine radiation hardness with density, high speed and low power dissipation require both hardened processes and hardened circuit design methods. CMOS/SOS circuits featuring self-compensation, self-biasing and parameter tracking accommodate a wide range of nonuniform on-chip parameter variations. These variations result from exposure to a nuclear radiation event, as well as from MOS device processing, temperature and power-supply effects. The circuits discussed in this paper are key elements for radiation-hardened memory designs [up to 106 rads(Si)] with state-of-the-art LSI density and performance. The CMOS/SOS memory cell sizes of 3.1 mil2 for a six-device, and 2.5 mil2 for a four-device, static cell are nearly five times smaller than previous radiation-hardened designs.
  • Keywords
    CMOS memory circuits; Circuit synthesis; Degradation; Ionizing radiation; Leakage current; MOS devices; Neutrons; Photoconductivity; Radiation hardening; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1978.4329512
  • Filename
    4329512