DocumentCode
83591
Title
Thermal Stability of Silicon Carbide Power JFETs
Author
Buttay, Cyril ; Ouaida, Remy ; Morel, Herve ; Bergogne, Dominique ; Raynaud, C. ; Morel, Florent
Author_Institution
Lab. Ampere, Univ. de Lyon, Villeurbanne, France
Volume
60
Issue
12
fYear
2013
fDate
Dec. 2013
Firstpage
4191
Lastpage
4198
Abstract
Silicon carbide (SiC) JFETs are attractive devices, but they might suffer from thermal instability. An analysis shows that two mechanisms could lead to their failure: the loss of gate control, which can easily be avoided, and a thermal runaway caused by the conduction losses. Destructive experimental tests performed on a dedicated system show that the latter mechanism is more severe than initially expected. A low thermal resistance and gate driver equipped with protections systems are thus required to ensure safe operation of the SiC JFETs.
Keywords
junction gate field effect transistors; power semiconductor devices; thermal stability; conduction loss; destructive experimental test; gate control; gate driver; low thermal resistance; power JFET; safe operation; thermal runaway; thermal stability; JFETs; Junctions; Logic gates; Resistance; Silicon carbide; Temperature measurement; Vehicles; JFET; silicon carbide (SiC); thermal runaway;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2013.2287714
Filename
6656909
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