DocumentCode
839476
Title
Stress Reduction and Enhanced Extraction Efficiency of GaN-Based LED Grown on Cone-Shape-Patterned Sapphire
Author
Lee, Jae-Hoon ; Oh, J.T. ; Kim, Y.C. ; Lee, Jung-Hee
Author_Institution
Opto Syst. Div., Samsung Electro-Mech. Co., Ltd., Suwon
Volume
20
Issue
18
fYear
2008
Firstpage
1563
Lastpage
1565
Abstract
High-quality InGaN-GaN film was grown on a cone-shape-patterned sapphire substrate (CSPSS) by using metal-oganic chemical vapor deposition. The growth mode of GaN on CSPSS was similar to that of the epitaxial lateral overgrowth (ELOG), because the growth, in the initial stage, proceeds only on flat basal sapphire substrate and there is no preferential growth plane on the cone region. An analysis of X-ray diffraction showed a shorter lattice constant of 5.1877 Aring along the c-axis for the GaN thin films grown on CSPSS, compared to 5.1913 A for the samples grown on a conventional sapphire substrate (CSS). This is because the ELOG-like mode of the GaN layer over the cone-shaped region results in less lattice mismatch and incoherency between the GaN layer and the sapphire substrate. The output power of a sideview light-emitting diode (LED) grown on CSPSS was estimated to be 7.3 mW at a forward current of 20 mA, which is improved by 34% compared to that of an LED grown on CSS. The significant enhancement in output power is attributed to both the increase of the extraction efficiency, resulted from the increase in photon escaping probability due to enhanced light scattering at the CSPSS, and the improvement of the crystal quality due to the reduction of dislocation.
Keywords
III-V semiconductors; MOCVD; X-ray diffraction; dislocations; gallium compounds; indium compounds; lattice constants; light emitting diodes; semiconductor thin films; Al2O3; InGaN-GaN; X-ray diffraction; cone-shape-patterned sapphire substrate; crystal quality; current 20 mA; dislocation reduction; enhanced extraction efficiency; lattice constant; lattice mismatch; light-emitting diode; metal-oganic chemical vapor deposition; stress reduction; Cascading style sheets; Chemical vapor deposition; Gallium nitride; Lattices; Light emitting diodes; Photonic crystals; Power generation; Stress; Substrates; X-ray diffraction; Dislocation; GaN; lattice constant; light-emitting diode (LED); patterned sapphire;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/LPT.2008.928844
Filename
4603049
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