• DocumentCode
    839531
  • Title

    Ka-band monolithic amplifier using 0.5 mu m gate length ion-implanted GaAs/AlGaAs heterojunction FET technology

  • Author

    Hwang, Taehyun ; Feng, Ming ; Lau, C.L.

  • Author_Institution
    Ford Microelectronics Inc., Colorado Springs, CO, USA
  • Volume
    27
  • Issue
    23
  • fYear
    1991
  • Firstpage
    2121
  • Lastpage
    2122
  • Abstract
    Monolithic, two-stage amplifiers using 0.5*80 mu m2 gate GaAs/AlGaAs heterojunction FETs have been developed for Ka-band operation. These monolithic two-stage amplifiers were fabricated using ion implantation for the active layer and optical lithography for the 0.5 mu m gate length. MMIC two-stage amplifiers achieved average gains of 12.6+or-1.4 dB at 30 GHz and 8.8+or-2.0 dB at 40 GHz, respectively, for all 39 sites across a three inch diameter wafer. These are the first reported results for MMIC two-stage amplifiers using 0.5 mu m gate length ion-implanted GaAs/AlGaAs heterojunction FETs achieving over 10 dB gain at Ka band.
  • Keywords
    III-V semiconductors; MMIC; aluminium compounds; field effect integrated circuits; gallium arsenide; ion implantation; microwave amplifiers; 0.5 micron; 30 to 40 GHz; 8.8 to 12.6 dB; EHF; GaAs-AlGaAs; Ka-band; MM-wave type; MMIC; heterojunction FET technology; ion implantation; monolithic amplifier; monolithic microwave IC; optical lithography; submicron gate length; two-stage amplifiers;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19911314
  • Filename
    104076