• DocumentCode
    840106
  • Title

    Secondary Emission Monitors at the Bevatron-Bevalac

  • Author

    Barale, John J. ; Crebbin, Kenneth C. ; Lax, John W. ; Richter, Robert M. ; Zajec, Emery

  • Author_Institution
    Lawrence Berkeley Laboratory, University of California, 1 Cyclotron Road, Berkeley, CA 94720
  • Volume
    26
  • Issue
    3
  • fYear
    1979
  • fDate
    6/1/1979 12:00:00 AM
  • Firstpage
    3412
  • Lastpage
    3414
  • Abstract
    Secondary Emission Monitors (SEM) are used for high intensity, high energy beam fluence monitoring of heavy ions. The improved electronics and autozeroing of background noise has extended the useful range of the SEM down to the region where the limiting factor is capacitive changes between the chamber foils, from acoustic and mechanical vibration. Usable levels are in the 104 particles per pulse range for C6 ions. The secondary electron yield is proportional to 1/ß2. This gives an increase in yield of about a factor of 25 for injection energies over peak energies at the Bevatron. This enhanced yield has been exploited in designing relative intensity and position monitors that give usable signal levels while intercepting only a small percentage of the injected beam. The detector in this case is a wire grid. The output can be: 1. Sum proportional to the beam intensity or as a time profile; 2. Split grids for a right-left monitor; 3. Single wire scan for a spatial profile. These monitors give usable signals down to a level of 0.01-0.1 ¿A of injected beam.
  • Keywords
    Acoustic beams; Acoustic emission; Acoustic pulses; Background noise; Electrons; Monitoring; Particle beam injection; Signal design; Vibrations; Wire;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1979.4330053
  • Filename
    4330053