DocumentCode :
840899
Title :
Fabrication and Characterization of Small Optical Ridge Waveguides Based on SU-8 Polymer
Author :
Yang, Bo ; Yang, Liu ; Hu, Rui ; Sheng, Zhen ; Dai, Daoxin ; Liu, Qingkun ; He, Sailing
Author_Institution :
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
Volume :
27
Issue :
18
fYear :
2009
Firstpage :
4091
Lastpage :
4096
Abstract :
Small SU-8 ridge optical waveguides with an air cladding and a SiO2 buffer on Si substrate have been realized by using a direct ultraviolet (UV) photolithography technology. The propagation loss measured by the cut-back method is about 0.1 dB/mm (@1550 nm) when the core width is 2.8 ??m. The bending losses of the present SU-8 optical ridge waveguides are also characterized. The measured results show that the bending loss decreases exponentially as the bending radius increases and the total loss can be reduced effectively by introducing an appropriate offset between two connected sections with different curvatures. A small bending radius (as small as 75 ??m) is still allowed for the requirement of a small bending loss (< 0.1 dB) when an offset of 0.1 ??m is introduced. Finally, by using this kind of waveguide, a small 1 ?? 2 Y-branch power splitter is fabricated and characterized.
Keywords :
optical fabrication; optical losses; optical polymers; optical waveguides; ridge waveguides; ultraviolet lithography; waveguide discontinuities; SU-8 polymer; Si; Si substrate; SiO2; SiO2 buffer; Y-branch power splitter; air cladding; bending loss; direct ultraviolet photolithography; optical ridge waveguides; propagation loss; size 2.8 mum; wavelength 1550 nm; Bending loss; SU-8; Y-branch; polymer; propagation loss; ridge waveguide;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2009.2022285
Filename :
4912305
Link To Document :
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