• DocumentCode
    840899
  • Title

    Fabrication and Characterization of Small Optical Ridge Waveguides Based on SU-8 Polymer

  • Author

    Yang, Bo ; Yang, Liu ; Hu, Rui ; Sheng, Zhen ; Dai, Daoxin ; Liu, Qingkun ; He, Sailing

  • Author_Institution
    State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
  • Volume
    27
  • Issue
    18
  • fYear
    2009
  • Firstpage
    4091
  • Lastpage
    4096
  • Abstract
    Small SU-8 ridge optical waveguides with an air cladding and a SiO2 buffer on Si substrate have been realized by using a direct ultraviolet (UV) photolithography technology. The propagation loss measured by the cut-back method is about 0.1 dB/mm (@1550 nm) when the core width is 2.8 ??m. The bending losses of the present SU-8 optical ridge waveguides are also characterized. The measured results show that the bending loss decreases exponentially as the bending radius increases and the total loss can be reduced effectively by introducing an appropriate offset between two connected sections with different curvatures. A small bending radius (as small as 75 ??m) is still allowed for the requirement of a small bending loss (< 0.1 dB) when an offset of 0.1 ??m is introduced. Finally, by using this kind of waveguide, a small 1 ?? 2 Y-branch power splitter is fabricated and characterized.
  • Keywords
    optical fabrication; optical losses; optical polymers; optical waveguides; ridge waveguides; ultraviolet lithography; waveguide discontinuities; SU-8 polymer; Si; Si substrate; SiO2; SiO2 buffer; Y-branch power splitter; air cladding; bending loss; direct ultraviolet photolithography; optical ridge waveguides; propagation loss; size 2.8 mum; wavelength 1550 nm; Bending loss; SU-8; Y-branch; polymer; propagation loss; ridge waveguide;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2009.2022285
  • Filename
    4912305