DocumentCode
840899
Title
Fabrication and Characterization of Small Optical Ridge Waveguides Based on SU-8 Polymer
Author
Yang, Bo ; Yang, Liu ; Hu, Rui ; Sheng, Zhen ; Dai, Daoxin ; Liu, Qingkun ; He, Sailing
Author_Institution
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
Volume
27
Issue
18
fYear
2009
Firstpage
4091
Lastpage
4096
Abstract
Small SU-8 ridge optical waveguides with an air cladding and a SiO2 buffer on Si substrate have been realized by using a direct ultraviolet (UV) photolithography technology. The propagation loss measured by the cut-back method is about 0.1 dB/mm (@1550 nm) when the core width is 2.8 ??m. The bending losses of the present SU-8 optical ridge waveguides are also characterized. The measured results show that the bending loss decreases exponentially as the bending radius increases and the total loss can be reduced effectively by introducing an appropriate offset between two connected sections with different curvatures. A small bending radius (as small as 75 ??m) is still allowed for the requirement of a small bending loss (< 0.1 dB) when an offset of 0.1 ??m is introduced. Finally, by using this kind of waveguide, a small 1 ?? 2 Y-branch power splitter is fabricated and characterized.
Keywords
optical fabrication; optical losses; optical polymers; optical waveguides; ridge waveguides; ultraviolet lithography; waveguide discontinuities; SU-8 polymer; Si; Si substrate; SiO2; SiO2 buffer; Y-branch power splitter; air cladding; bending loss; direct ultraviolet photolithography; optical ridge waveguides; propagation loss; size 2.8 mum; wavelength 1550 nm; Bending loss; SU-8; Y-branch; polymer; propagation loss; ridge waveguide;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.2009.2022285
Filename
4912305
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