DocumentCode :
840952
Title :
Microstructural study of EuBa2Cu3O7 films by high resolution X-ray diffraction
Author :
Lin, Y. ; Wang, H. ; Hawley, M.E. ; Foltyn, S.R. ; Jia, Q.X.
Author_Institution :
Mater. Sci. & Technol. Div., Los Alamos Nat. Lab., NM, USA
Volume :
15
Issue :
2
fYear :
2005
fDate :
6/1/2005 12:00:00 AM
Firstpage :
2731
Lastpage :
2734
Abstract :
Recent studies have shown that EuBa2Cu3O7 (Eu123) films exhibit excellent surface morphology, high transition temperature, and interesting field-dependent critical current density, which are important for thin film devices and coated conductor applications. In this paper, we report our detailed studies of the microstructures of the Eu123 films deposited under different conditions. We have used high-resolution x-ray diffraction (HRXRD) to investigate the texture evolution and micro-domains of the films. Reciprocal space maps (RSMs) show that the a-axis growth of Eu123 films on SrTiO3 substrates at a given deposition temperature is directly related to the deposition rate. On the other hand, by inserting a DyBa2Cu3O7 (Dy123) seed layer, the a-axis growth can be totally eliminated. HRXRD study further reveals that micro-domains with different c-axis lattice parameters are often formed in the Eu123/Dy123, which may result from different oxygen content.
Keywords :
X-ray diffraction; barium compounds; critical current density (superconductivity); crystal microstructure; dysprosium compounds; europium compounds; lattice constants; strontium compounds; substrates; superconducting thin films; superconducting transition temperature; surface morphology; titanium compounds; DyBa2Cu3O7; Dyl23; EuBa2Cu3O7; Eul23 films; a-axis growth; c-axis lattice parameters; coated conductor applications; deposition rate; deposition temperature; field-dependent critical current density; high resolution x-ray diffraction; high transition temperature; high-resolution x-ray diffraction; micro-domains; microstructural study; reciprocal space maps; surface morphology; texture evolution; thin film devices; Conductive films; Critical current density; High temperature superconductors; Microstructure; Substrates; Superconducting films; Superconducting transition temperature; Surface morphology; Thin film devices; X-ray diffraction; Deposition rate; high-resolution x-ray diffraction; seed-layer;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/TASC.2005.847800
Filename :
1440232
Link To Document :
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