DocumentCode :
842398
Title :
Radiation-Hardening Static NMOS Rams
Author :
King, E.E.
Author_Institution :
Naval Research Laboratory Washington, D. C. 20375
Volume :
26
Issue :
6
fYear :
1979
Firstpage :
5060
Lastpage :
5064
Abstract :
The results of an effort to total-dose radiation harden N-channel static random-access-memories are described. Both an aluminum-gate and a silicon-gate process were hardened to a level greater than 104 rads(Si) on a semiconductor memory vendor´s production line. The aluminum-gate RAMs have been found to operate to well above 105 rads(Si) at low dose rates, suggesting their suitability for space applications.
Keywords :
Circuits; Laboratories; Large scale integration; Leakage current; MOS devices; Production; Radiation hardening; Semiconductor memory; Space technology; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1979.4330273
Filename :
4330273
Link To Document :
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