Title :
Radiation-Hardening Static NMOS Rams
Author_Institution :
Naval Research Laboratory Washington, D. C. 20375
Abstract :
The results of an effort to total-dose radiation harden N-channel static random-access-memories are described. Both an aluminum-gate and a silicon-gate process were hardened to a level greater than 104 rads(Si) on a semiconductor memory vendor´s production line. The aluminum-gate RAMs have been found to operate to well above 105 rads(Si) at low dose rates, suggesting their suitability for space applications.
Keywords :
Circuits; Laboratories; Large scale integration; Leakage current; MOS devices; Production; Radiation hardening; Semiconductor memory; Space technology; Threshold voltage;
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.1979.4330273