• DocumentCode
    844376
  • Title

    Local temperature response to pulsed discharges in electronic discharge machining (EDM) environment

  • Author

    Revaz, Bernard ; Emery, Jonathan ; Witz, Grégoire ; Flükiger, René ; Perez, Roberto ; Carron, Jonathan ; Rappaz, Michel

  • Author_Institution
    Dept. De Phys., Univ. of Geneva, Switzerland
  • Volume
    33
  • Issue
    3
  • fYear
    2005
  • fDate
    6/1/2005 12:00:00 AM
  • Firstpage
    1066
  • Lastpage
    1071
  • Abstract
    We report on local temperature measurements performed during single discharges in electronic discharge machining (EDM) environment. Measurements have been performed with two different setups. One being a thermal device consisting of 14 thin film Au-Pd thermocouples. This device with 4-μm2 large junctions was patterned using standard photolithography. The distance between the junctions (i.e., the local resolution of the device) is 20 μm, whereas the sensitivity is 10 μV/K at 150°C. The other setup being a fast infrared charge-coupled device (CCD) camera with home made control electronics. An acquisition rate of 80 000 pictures/s with a 10-μm local resolution was obtained. Using standard electron discharge machining (EDM) equipment, the temperature response due to a single discharge was measured with both the equipment, which show excellent agreement. The maximum temperature measured on the backside of a 20-μm-thick foil is 590°C. Analysis of the thermovoltage noise pattern allowed precise determination of the beginning and duration of the discharge. The numerical simulation of the process is presented and discussed.
  • Keywords
    discharges (electric); electrical discharge machining; plasma diagnostics; plasma simulation; plasma temperature; 10 mum; 150 degC; 20 mum; 590 degC; CCD; control electronics; electronic discharge machining; fast infrared charge-coupled device camera; local temperature measurements; numerical simulation; photolithography; pulsed discharges; thermal device; thermovoltage noise pattern; thin film thermocouples; Charge coupled devices; Charge-coupled image sensors; Electrons; Lithography; Machining; Measurement standards; Performance evaluation; Temperature measurement; Temperature sensors; Thin film devices; Discharges; microsensors; temperature measurement;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2005.848611
  • Filename
    1440544