DocumentCode
847026
Title
Electron and Hole Current Characteristics of n-i-p-Type Semiconductor Quantum Dot Transistor
Author
Fujihashi, Chugo ; Yukiya, Tokio ; Asenov, Asen
Author_Institution
Dept. of Appl. Comput. Sci., Tokyo Polytech. Univ., Atsugi
Volume
6
Issue
3
fYear
2007
fDate
5/1/2007 12:00:00 AM
Firstpage
320
Lastpage
327
Abstract
For the future development of semiconductor quantum dot transistors, a novel n-i-p-type semiconductor quantum dot transistor consisting of an n-type source, an i-type dot, and a p-type drain is presented in this paper. The explicit steady-state solution to a set of an infinite number of stochastic theoretical probability equations is given. The solution is applicable to both metal and semiconductor quantum dot transistors. The electron and hole current characteristics controlled by means of the gate voltage are computed numerically, and it is pointed out that the electron or hole current state can be selected by applying a positive or negative gate voltage
Keywords
semiconductor device models; semiconductor quantum dots; stochastic processes; transistors; electron current characteristics; explicit steady-state solution; gate voltage; hole current characteristics; i-type dot; n-i-p-type semiconductor quantum dot transistor; n-type source; p-type drain; stochastic theoretical probability equations; Charge carrier processes; Contact resistance; Equations; Integrated circuit technology; Quantum dots; Quantum mechanics; Steady-state; Stochastic processes; Transistors; Tunneling; Electron and hole current; n-i-p type; quantum dot transistor; stochastic theoretical solution;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2007.893570
Filename
4200728
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