Title :
A novel straight arrayed waveguide grating with linearly varying refractive-index distribution
Author :
Kawakita, Yasumasa ; Saitoh, Takayoshi ; Shimotaya, Suguru ; Shimomura, Kazuhiko
Author_Institution :
Dept. of Electr. & Electron. Eng., Sophia Univ., Tokyo, Japan
Abstract :
A novel arrayed waveguide grating in which refractive index varies across the array fabricated by metal-organic vapor phase epitaxy (MOVPE) selective area growth is proposed. The waveguide thickness increases from one end and refractive index increases accordingly and the phase of propagating light in each arrayed waveguide is different. Therefore, straight waveguides are possible, reducing device dimensions and optical propagation losses. As the experimental results, fabrication of sample devices is achieved in a single pass using a MOVPE selective area growth technique and simple wavelength separation of the fabricated devices yielded successful results.
Keywords :
Fresnel diffraction; III-V semiconductors; MOCVD; arrayed waveguide gratings; demultiplexing equipment; gallium arsenide; indium compounds; optical communication equipment; optical fabrication; optical planar waveguides; quantum well devices; refractive index; semiconductor quantum wells; vapour phase epitaxial growth; wavelength division multiplexing; Fresnel diffraction pattern; GaInAs-InP; direct waveguide formation; linearly varying refractive-index distribution; metal-organic vapor phase epitaxy; multiple quantum well; operational principles; propagating light phase; propagation losses; selective area growth; straight arrayed waveguide grating; waveguide thickness; wavelength demultiplexer; wavelength separation; Arrayed waveguide gratings; Epitaxial growth; Epitaxial layers; Optical arrays; Optical losses; Optical propagation; Optical refraction; Optical waveguides; Phased arrays; Refractive index;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2003.819366