The effects of deposition parameters on iron films RF diode sputtered in argon-nitrogen

Iron-nitrogen films deposited in an argon-N₂ sputtering gas were characterized as a function of RF diode sputtering parameters and the N₂ partial pressure. The magnetic properties of the films were generally soft until they contained about 1 at.% nitrogen, which corresponded to an impingement rate ratio of nitrogen to iron of about 400 to 1. At that composition H_c and H_k increased abruptly. Optimum substrate bias was found to depend on the substrate used. Annealed films exhibited significant decreases in H_c and H_k , and the saturation magnetostriction could be adjusted to near zero by adding nitrogen. Corrosion properties were also improved with added nitrogen