• DocumentCode
    855233
  • Title

    Effect of very thin Cr underlayers on the micromagnetic structure of RF sputtered CoCrTa thin films

  • Author

    Yeh, T. ; Sivertsen, J.M. ; Judy, J.H.

  • Author_Institution
    Minnesota Univ., Minneapolis, MN, USA
  • Volume
    26
  • Issue
    5
  • fYear
    1990
  • fDate
    9/1/1990 12:00:00 AM
  • Firstpage
    1590
  • Lastpage
    1592
  • Abstract
    The effects of very thin Cr underlayers on the initial susceptibilities and micromagnetic structures of RF sputtered CoCrTa thin films have been studied. It was found that the initial susceptibility of the CoCrTa films on thin Cr underlayers is a factor of 2.5 to 3.5 times smaller than the value of the CoCrTa film without any Cr underlayer. The micromagnetic images of these CoCrTa films on thin Cr underlayers also exhibit a different feature from the CoCrTa film deposited on substrate with no Cr underlayer. The thicker the Cr underlayers, the finer are the micromagnetic images observed at both the as-deposited and the remanent state. It is very likely that the Cr underlayers induce stress in the CoCrTa/Cr double-layer thin films, and, through magnetoelastic interactions, the micromagnetic structures will be refined by the formation of barriers which pin the domain walls. This model could explain the low initial susceptibility and high in-plane coercivity in the RF-sputtered thin CoCrTa/Cr double layer films
  • Keywords
    chromium; chromium alloys; cobalt alloys; coercive force; magnetic domain walls; magnetic structure; magnetic susceptibility; magnetic thin films; magnetoelastic effects; remanence; sputtered coatings; tantalum alloys; Cr-CoCrTa; RF sputtered CoCrTa thin films; as deposited state; barrier formation; domain wall pinning; double-layer thin films; in-plane coercivity; induced stress; initial susceptibility; layer thickness; magnetoelastic interactions; micromagnetic structure; remanent state; very thin Cr underlayers; Chromium; Coercive force; Magnetic domain walls; Magnetic domains; Micromagnetics; Radio frequency; Sputtering; Stress; Substrates; Transistors;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.104457
  • Filename
    104457