Increase of the Electrical Resistance of Thin Copper Film Due to 14 MeV Neutron Irradiation

Author

Agrawal, S.K. ; Kumar, U. ; Singh, S.P. ; Nigam, A.K.

Author_Institution

Van de Graaff Laboratory, Department of Physics Banaras Hindu University, Varanasi-221005(India)

Volume

28

Issue

2

fYear

1981

fDate

4/1/1981 12:00:00 AM

Firstpage

1866

Lastpage

1868

Abstract

The variation in the electrical resistance of thin copper film (500 Ã… thick), grown on the glass slide has been measured with Increasing 14 MeV neutron Irradiation time. The electrical resistance vs irradiation time curveshows an Interesting behaviour after an irradiation of 40 minutes. However, there is a net increase in the electrical resistance with increasing neutron dose. The maximum increase in the observed electrical resistance after an irradiation of 115 mins, is 4.45%. The microstructural studies of irradiated film were made using TEM & TED techniques. The TEM patterns upto an irradiation time of 1.00 hr do not show any appreciable change in the microstructure. The TED patterns also do not show any appreciable change in the diffraction pattern upto an irradiation time of 1.0 hr. But after an irradiation time of 1.5 hrs, two extra rings appear In the TED pattern which disappear with increasing neutron irradiation time.

Keywords

Copper; Diffraction; Electric resistance; Electric variables measurement; Electrical resistance measurement; Glass; Microstructure; Neutrons; Thickness measurement; Time measurement;

fLanguage

English

Journal_Title

Nuclear Science, IEEE Transactions on

Publisher

ieee

ISSN

0018-9499

Type

jour

DOI

10.1109/TNS.1981.4331542

Filename

4331542