DocumentCode :
855481
Title :
X-ray diffraction characterization of stress and crystallographic texture in thin film media
Author :
Bain, J.A. ; Clemens, B.M. ; Brennan, S.M. ; Kataoka, H.
Author_Institution :
Dept. of Mater. Sci. & Eng., Stanford Univ., CA, USA
Volume :
29
Issue :
1
fYear :
1993
fDate :
1/1/1993 12:00:00 AM
Firstpage :
300
Lastpage :
306
Abstract :
X-ray diffraction was used to measure the stress and the in-plane crystallographic texture of Co alloy films on grooved substrates. The preference for the c-axis to lie parallel to the groove direction was quantified. A small in-plane stress was measured which displayed an anisotropy between the two directions. The magnitude of this stress appears to be large enough (according to a simple calculation) to contribute to observed coercive anisotropies. The techniques used for extracting the in-plane crystallographic texture and the value of the in-plane stress from the X-ray measurements are discussed
Keywords :
X-ray diffraction examination of materials; cobalt alloys; ferromagnetic properties of substances; internal stresses; magnetic recording; magnetic thin films; sputtered coatings; texture; Co alloy films; X-ray diffraction; c-axis orientation preference; coercive anisotropies; crystallographic texture; grooved substrates; in-plane stress; magnetic thin films; sputtered films; thin film media; Anisotropic magnetoresistance; Crystallography; Geometry; Laboratories; Magnetic films; Stress; Synchrotron radiation; Transistors; X-ray diffraction; X-ray scattering;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.195586
Filename :
195586
Link To Document :
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