Ferromagnetic Thin Films for Loss Reduction in On-Chip Transmission Lines

Author

Amiri, Pedram Khalili ; Rejaei, Behzad ; Zhuang, Yan ; Vroubel, Marina ; Burghartz, Joachim N.

Author_Institution

Delft Inst. of Microelectron. & Submicron Technol. (DIMES), Delft Univ. of Technol.

Volume

43

Issue

6

fYear

2007

fDate

6/1/2007 12:00:00 AM

Firstpage

2630

Lastpage

2632

Abstract

Microstrip transmission lines fabricated on standard silicon wafers are shown to benefit from the incorporation of thin ferromagnetic Ni-Fe films when compared to control devices without Ni-Fe. At 1 GHz, inductance and quality factor of the microstrip lines are enhanced by factors of 6 and 3, respectively, while the characteristic impedance of a 20 mum wide line is increased by 85%. For constant characteristic impedance, a 200 nm thick Ni-Fe film reduces attenuation from 1.6 to 0.7 dB/cm at 500 MHz

Keywords

Q-factor; eddy current losses; ferromagnetic materials; high-frequency transmission lines; inductance; iron alloys; magnetic leakage; magnetic thin films; microstrip lines; nickel alloys; 1 GHz; 20 mum; 200 nm; 500 GHz; NiFe; attenuation; ferromagnetic thin films; impedance; inductance; loss reduction; microstrip transmission lines; on-chip transmission lines; quality factor; silicon wafers; Attenuation; Impedance; Inductance; Microstrip; Propagation losses; Q factor; Semiconductor films; Silicon; Transistors; Transmission lines; Integrated circuit interconnections; magnetic microwave devices; microstrip; planar transmission lines;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2007.893708

Filename

4202647