• DocumentCode
    859567
  • Title

    Improved current gain in bipolar transistor with bandgap narrowing in base

  • Author

    Sugii, Toshihiro ; Yamazaki, Tsutomu ; Ito, Takao

  • Author_Institution
    Fujitsu Labs. Ltd., Atsugi, Japan
  • Volume
    25
  • Issue
    1
  • fYear
    1989
  • Firstpage
    60
  • Lastpage
    61
  • Abstract
    Bandgap narrowing in a base was utilised to improve the current gain of the Si bipolar transistor. It enhances the injection of emitter current into the base. A transistor the authors fabricated with a base doping concentration of 2*1019/cm3 showed a bandgap narrowing of about 90 meV that enables about 25 times more collector current to flow than where there is now narrowing. Bandgap narrowing enables the fabrication of a transistor with a very thin base, enough current gain and moderate base resistance.
  • Keywords
    bipolar transistors; elemental semiconductors; semiconductor technology; silicon; Si bipolar transistor; bandgap narrowing in base; base doping concentration; current gain; down sizing; epitaxially grown base transistor; injection of emitter current; moderate base resistance; scaling; semiconductors; very thin base;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19890043
  • Filename
    19670