DocumentCode
862858
Title
Fabrication techniques and characteristics of Al-SiO2 laminated optical polarizers
Author
Sato, Takashi ; Baba, Kazutaka ; Hirozawa, Toru ; Shiraishi, Kazuo ; Kawakami, Shojiro
Author_Institution
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan
Volume
29
Issue
1
fYear
1993
fDate
1/1/1993 12:00:00 AM
Firstpage
175
Lastpage
181
Abstract
Techniques for fabricating laminated polarizers (LAMIPOLs), which consist of alternating laminated layers of aluminum and silica, for the wavelength region λ>1 μm, are investigated. The oxidation of Al films is prevented by a suitable choice of deposition conditions. The surfaces of SiO2 films are smoothed by bias sputtering. A 10 μm thick LAMIPOL was obtained having an insertion loss of 0.15 dB and an extinction ratio of greater than 60 dB at the wavelength of 1.3 μm. These characteristics can be estimated from the attenuated constants of the fundamental modes even when higher modes are considered
Keywords
aluminium; integrated optics; laminates; optical films; optical polarisers; optical workshop techniques; silicon compounds; sputter deposition; 1.3 micron; 60 dB; Al films; Al-SiO2 laminated optical polarizers; LAMIPOL; SiO2 films; alternating laminated layers; attenuated constants; bias sputtering; extinction ratio; fabrication techniques; fundamental modes; insertion; integrated optical circuits; oxidation; surfaces; wavelength region; Dielectrics; Insertion loss; Optical attenuators; Optical device fabrication; Optical films; Optical interferometry; Optical losses; Optical polarization; Optical sensors; Tellurium;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/3.199257
Filename
199257
Link To Document