• DocumentCode
    866301
  • Title

    A numerical analysis of submicrometer InP-transferred electron devices

  • Author

    Wu, K.F. ; Shaw, M.P.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Wayne State Univ., Detroit, MI, USA
  • Volume
    36
  • Issue
    3
  • fYear
    1989
  • fDate
    3/1/1989 12:00:00 AM
  • Firstpage
    603
  • Lastpage
    606
  • Abstract
    A numerical technique combining the Boltzmann transport equation and a cathode mobility model has been used to simulate the nonuniform field configurations and the static and dynamic transport behavior of submicrometer InP-transferred electron devices (TEDs). Significant interrelated controlling features for the 70-230-GHz operation of these devices have been analyzed. They determine the manifestation of the current instabilities in the following ways: (1) the length has a significant effect on the velocity-field characteristics for submicrometer TEDs, and thus on the oscillation threshold as well as the upper-frequency limit for transit-time oscillations; and (2) the cathode mobility (boundary condition), doping density, and bias acting together have a dominant effect on the threshold and cutoff of the current instability. The numerical results can be used to determine the optimum efficiency and frequency of actual devices
  • Keywords
    Gunn devices; III-V semiconductors; indium compounds; numerical analysis; semiconductor device models; 0.1 to 1 micron; 70 to 230 GHz; Boltzmann transport equation; EHF; Gunn devices; InP transferred electron devices; TEDs; bias; boundary condition; cathode mobility model; current instabilities; doping density; dynamic transport behavior; interrelated controlling features; nonuniform field configurations; numerical analysis; numerical results; numerical technique; optimum efficiency; oscillation threshold; submicrometer TEDs; transit-time oscillations; upper-frequency limit; velocity-field characteristics; Atomic measurements; Cathodes; Electron devices; Frequency; Gallium arsenide; Humidity; Indium phosphide; Numerical analysis; Scanning electron microscopy; X-ray imaging;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.19975
  • Filename
    19975