DocumentCode :
867422
Title :
Turnover phenomenon of N+N N+plate contact silicon device and second breakdown in transistors
Author :
Agatsuma, T. ; Kohisa, T. ; Sugiyama, Akihiko
Author_Institution :
Musashi Works, Hitachi, Ltd., Tokyo, Japan
Volume :
53
Issue :
1
fYear :
1965
Firstpage :
95
Lastpage :
95
Keywords :
Conductivity; Delay effects; Electric breakdown; Electric resistance; P-n junctions; Silicon devices; Temperature dependence; Temperature sensors; Voltage;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1965.3545
Filename :
1445475
Link To Document :
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