• DocumentCode
    869926
  • Title

    X-Ray Irradiation and Bias Effects in Fully-Depleted and Partially-Depleted SiGe HBTs Fabricated on CMOS-Compatible SOI

  • Author

    Bellini, Marco ; Jun, Bongim ; Chen, Tianbing ; Cressler, John D. ; Marshall, Paul W. ; Chen, Dakai ; Schrimpf, Ronald D. ; Fleetwood, Daniel M. ; Cai, Jin

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA
  • Volume
    53
  • Issue
    6
  • fYear
    2006
  • Firstpage
    3182
  • Lastpage
    3186
  • Abstract
    X-ray total ionizing dose effects in both fully-depleted and partially-depleted SiGe HBT-on-SOI transistors are investigated at room and at cryogenic temperatures for the first time. Devices irradiated in grounded and forward-active mode configurations exhibit a different behavior depending on the collector doping of the device. The degradation produced by 10 keV x-rays is compared to previously reported 63 MeV proton results on the same fully-depleted SiGe HBT-on-SOI devices, showing decreased degradation for proton irradiation. Both collector and substrate bias are shown to affect the two-dimensional nature of the current flow in these devices, resulting in significant differences in the avalanche multiplication characteristics (hence, breakdown voltage) across temperature
  • Keywords
    X-ray effects; cryogenics; heterojunction bipolar transistors; semiconductor heterojunctions; silicon-on-insulator; 293 to 298 K; CMOS-compatible SOI; SiGe; TCAD; X-ray irradiation effects; X-ray total ionizing dose effects; avalanche multiplication characteristics; bias effects; breakdown voltage; collector doping; cryogenic temperatures; current flow; forward-active mode configurations; fully-depleted SiGe HBT; grounded configurations; heterojunction bipolar transistors; partially-depleted SiGe HBT; proton irradiation; silicon-on-insulator technology; substrate bias; CMOS technology; Cryogenics; Degradation; Germanium silicon alloys; Protons; Silicon germanium; Silicon on insulator technology; Space technology; Substrates; Temperature; Heterojunction bipolar transistors; SOI; SiGe HBT; TCAD; radiation effects; silicon-on-insulator technology;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2006.885795
  • Filename
    4033220