• DocumentCode
    870175
  • Title

    Radiation Dose Effects in Trigate SOI MOS Transistors

  • Author

    Colinge, J.P. ; Orozco, A. ; Rudee, J. ; Xiong, Weize ; Cleavelin, C. Rinn ; Schulz, T. ; Schrufer, K. ; Knoblinger, G. ; Patruno, P.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., California Univ., Davis, CA
  • Volume
    53
  • Issue
    6
  • fYear
    2006
  • Firstpage
    3237
  • Lastpage
    3241
  • Abstract
    N-channel trigate SOI MOSFETs have been irradiated with 60 Co gamma rays at doses up to 6 Mrad(SiO2). The threshold voltage shift at 6 Mrad is less than 10 mV in transistors with a gate length of 0.3 mum. At 6 Mrad(SiO2), the current drive reduction in the same devices is 10% if VG=0 V during irradiation and 20% if VG=1 V during the irradiation. The generation of positive charges in the BOX increases the electron concentration at the bottom interface of the silicon fins. Inversion electrons at the bottom interface have a higher mobility than the electrons at the (110)-oriented fin sidewalls. As a result, an increase of transconductance with dose is observed at moderate doses [<1 Mrad(SiO2)]. At higher doses, the usual mobility degradation caused by interface trap generation is observed
  • Keywords
    MOSFET; electron mobility; gamma-ray effects; silicon-on-insulator; (110)-oriented fin sidewalls; 60Co gamma rays; N-channel trigate SOI MOS transistors; bottom interface; electron concentration; interface trap generation; inversion electrons; mobility degradation; semiconductor device radiation dose effects; silicon fins; silicon on insulator technology; threshold voltage shift; transconductance; trigate SOI MOSFET; Degradation; Electron mobility; Electron traps; Gamma rays; MOSFETs; Radiation hardening; Semiconductor films; Silicon on insulator technology; Threshold voltage; Transconductance; MOSFETs; semiconductor device radiation effects; silicon on insulator technology;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2006.885841
  • Filename
    4033341