DocumentCode :
870265
Title :
Evidence of different conduction mechanisms in accumulation-mode p-channel SOI MOSFET´s at room and liquid-helium temperatures
Author :
Rotondaro, Antonio Luis Pacheco ; Magnusson, Ulf K. ; Claeys, Cor ; Flandre, Denis ; Terao, Akira ; Colinge, Jean-Pierre
Author_Institution :
IMEC, Leuven, Belgium
Volume :
40
Issue :
4
fYear :
1993
fDate :
4/1/1993 12:00:00 AM
Firstpage :
727
Lastpage :
732
Abstract :
The threshold voltage for the three different conduction components of an accumulation-mode PMOS SOI were experimentally extracted at room and liquid-helium temperatures. A deep-depletion transient effect was observed to play an important role when one of the interfaces was in inversion, even at room temperature. An intuitive physical interpretation is given for the suppression of some current components at liquid-helium temperatures. In addition, a simple model for calculating the silicon-film thickness and the doping level is presented
Keywords :
insulated gate field effect transistors; semiconductor device models; semiconductor-insulator boundaries; thin film transistors; 4.2 K; SOI MOSFETs; Si film thickness; accumulation-mode PMOSFETs; conduction components; conduction mechanisms; current components suppression; deep-depletion transient effect; doping level; liquid He temperature; model; physical interpretation; room temperature; threshold voltage; Analytical models; Current measurement; Data mining; Doping; Helium; MOSFET circuits; Senior members; Temperature; Threshold voltage; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.202784
Filename :
202784
Link To Document :
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